Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate

doi:10.3969/j.issn.1007-2861.2014.04.007

上海大学学报(自然科学版) ›› 2014, Vol. 20 ›› Issue (6): 680-688.doi: 10.3969/j.issn.1007-2861.2014.04.007

Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate

REN Xiao-yan, LEI Hong, CHEN Ru-ling, CHEN Yi

Nano-Science and Technology Research Center, Shanghai University, Shanghai 200444, China

出版日期:2014-12-23 发布日期:2014-12-23
通讯作者: Lei Hong, Professor, Ph. D. E-mail:hong lei2005@aliyun.com
作者简介:Lei Hong, Professor, Ph. D., E-mail: hong lei2005@aliyun.com
基金资助:
the National Natural Science Foundation of China (51175317), the Doctoral Program of Higher Education of China (20123108110016)

Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate

REN Xiao-yan, LEI Hong, CHEN Ru-ling, CHEN Yi

Nano-Science and Technology Research Center, Shanghai University, Shanghai 200444, China

Online:2014-12-23 Published:2014-12-23
Contact: Lei Hong, Professor, Ph. D., E-mail: hong lei2005@aliyun.com E-mail:hong lei2005@aliyun.com
About author:Lei Hong, Professor, Ph. D., E-mail: hong lei2005@aliyun.com

摘要/Abstract

摘要： To optimize the existing slurry for abrasive-free polishing (AFP) of hard disk substrate, a water-soluble free radical initiator, 2, 20-azobis [2-(2-imidazolin-2-yl) propane] dihydrochloride (AIBI) is introduced to the H₂O₂-based slurry. The polishing results show that, the material removal rate (MRR) of hard disk substrate polished with H₂O₂-based slurry containing AIBI is obviously higher than that without AIBI. The acting mechanism of the improved MRR is investigated. Electron paramagnetic resonances tests show that, by comparison with H₂O₂ slurry, H₂O₂-AIBI slurry provides higher concentration of hydroxyl radicals. Auger electron spectrometer analyses further demonstrate that the oxidation ability of H₂O₂-AIBI slurry is much greater than H₂O₂ slurry. In addition, potentiodynamic
polarization tests show that the corrosion dissolution rate of hard disk substrate in H₂O₂-AIBI slurry is increased. Therefore that stronger oxidation ability and a higher corrosion dissolution rate of H₂O₂-AIBI slurry lead to higher MRR can be concluded.

关键词: abrasive-free polishing (AFP), hard disk substrate, initiator, material removal rate

Abstract: To optimize the existing slurry for abrasive-free polishing (AFP) of hard disk substrate, a water-soluble free radical initiator, 2, 20-azobis [2-(2-imidazolin-2-yl) propane] dihydrochloride (AIBI) is introduced to the H₂O₂-based slurry. The polishing results show that, the material removal rate (MRR) of hard disk substrate polished with H₂O₂-based slurry containing AIBI is obviously higher than that without AIBI. The acting mechanism of the improved MRR is investigated. Electron paramagnetic resonances tests show that, by comparison with H₂O₂ slurry, H₂O₂-AIBI slurry provides higher concentration of hydroxyl radicals. Auger electron spectrometer analyses further demonstrate that the oxidation ability of H₂O₂-AIBI slurry is much greater than H₂O₂ slurry. In addition, potentiodynamic polarization tests show that the corrosion dissolution rate of hard disk substrate in H₂O₂-AIBI slurry is increased. Therefore that stronger oxidation ability and a higher corrosion dissolution rate of H₂O₂-AIBI slurry lead to higher MRR can be concluded.

Key words: abrasive-free polishing (AFP), hard disk substrate, material removal rate;initiator

中图分类号:

TH 117.3

REN Xiao-yan, LEI Hong, CHEN Ru-ling, CHEN Yi. Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate[J]. 上海大学学报(自然科学版), 2014, 20(6): 680-688.

REN Xiao-yan, LEI Hong, CHEN Ru-ling, CHEN Yi. Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate[J]. Journal of Shanghai University（Natural Science Edition）, 2014, 20(6): 680-688.

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Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate

Effect of AIBI as Free Radical Initiator on Abrasive-Free Polishing of Hard Disk Substrate

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