Y3+ 掺杂二氧化硅磨料的合成及其在氧化锆陶瓷中的
化学机械抛光行为

doi:10.12066/j.issn.1007-2861.2390

上海大学学报(自然科学版) ›› 2024, Vol. 30 ›› Issue (1): 31-042.doi: 10.12066/j.issn.1007-2861.2390

Y³⁺ 掺杂二氧化硅磨料的合成及其在氧化锆陶瓷中的化学机械抛光行为

代三威¹, 雷红^1,2, 付继芳²

1. 上海大学材料科学与工程学院, 上海 200444; 2. 上海大学理学院, 上海 200444

收稿日期:2022-02-13 出版日期:2024-02-28 发布日期:2024-02-27
通讯作者: 雷红 (1968—), 男, 教授, 博士生导师, 博士, 研究方向为化学机械抛光. E-mail:hong_lei2005@163.com
基金资助:
国家自然科学基金资助项目 (51975343)

Preparation of Y³⁺-doped silica abrasives and the chemical mechanical polishing behavior of zirconia ceramics

DAI Sanwei¹, LEI Hong^1,2, FU Jifang²

1. School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China; 2. College of Sciences, Shanghai University, Shanghai 200444, China

Received:2022-02-13 Online:2024-02-28 Published:2024-02-27

摘要/Abstract

摘要： 为了提高氧化锆陶瓷的抛光效率, 在二氧化硅表面掺杂 Y³⁺ 得到改性磨料. X 射线光电子能谱 (X-ray photoelectron spectroscopy, XPS) 分析表明, Y 元素以 Y(OH)₃ 的形式存在于改性磨料中. 扫描电子显微镜 (scanning electron microscope, SEM) 和粒度分析结果表明, 复合磨料呈球形, 粒度均匀, 无聚集体和 2 次颗粒出现. 与纯胶体二氧化硅磨料相比, 材料去除率 (material removal rate, MRR) 提高了 33% 左右. MRR 增大的原因是掺杂的 Y(OH)₃改变了二氧化硅颗粒的 Zeta 电位, 减小了二氧化硅颗粒与氧化锆陶瓷之间的排斥力, 增大了二氧化硅颗粒和氧化锆陶瓷基体之间的接触概率, 导致摩擦系数增大.

关键词: 氧化锆陶瓷, 化学机械抛光, 磨料, 掺杂二氧化硅, Derjaguin-Landau-Verwey- Overbeek 理论

Abstract: To improve the polishing efficiency of zirconia ceramics, Y³⁺ was doped on the surface of silica to obtain modified abrasives. X-ray photoelectron spectroscopy (XPS) analysis showed that the Y element exists in the modified abrasive in the form of Y(OH)₃. Results of scanning electron microscopy (SEM) and particle size analysis showed that the composite abrasives were spherical with a uniform particle size, and no aggregation and secondary particles appeared. Compared with the pure colloidal silica abrasive, the material removal rate (MRR) of the composite abrasives was increased by approximately 33%. It also changes the zeta potential of the silica particles and reduces the repulsion between the silica and zirconia ceramic surface. This increases the contact probability between the silica and zirconia ceramic wafer, resulting in an increase in the coefficient of friction.

Key words: zirconia ceramic, chemical mechanical polishing, abrasives, doped silica; Derjaguin-Landau-Verwey-Overbeek theory

中图分类号:

TG 739

代三威, 雷红, 付继芳. Y³⁺ 掺杂二氧化硅磨料的合成及其在氧化锆陶瓷中的化学机械抛光行为[J]. 上海大学学报(自然科学版), 2024, 30(1): 31-042.

DAI Sanwei, LEI Hong, FU Jifang. Preparation of Y³⁺-doped silica abrasives and the chemical mechanical polishing behavior of zirconia ceramics[J]. Journal of Shanghai University（Natural Science Edition）, 2024, 30(1): 31-042.

[1]	董越, 雷红, 刘文庆. 哑铃型氧化硅磨粒的制备及其化学机械抛光性能[J]. 上海大学学报(自然科学版), 2023, 29(2): 345-.
[2]	邹虹荣, 石磊, 林成辉, 张亚萍, 刘立起. 石墨烯/氧化锆复合材料的分散液工艺优化及润湿性能[J]. 上海大学学报(自然科学版), 2020, 26(1): 102-112.

Y³⁺ 掺杂二氧化硅磨料的合成及其在氧化锆陶瓷中的化学机械抛光行为

Preparation of Y³⁺-doped silica abrasives and the chemical mechanical polishing behavior of zirconia ceramics

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