哑铃型氧化硅磨粒的制备及其化学机械抛光性能

doi:10.12066/j.issn.1007-2861.2329

上海大学学报(自然科学版) ›› 2023, Vol. 29 ›› Issue (2): 345-.doi: 10.12066/j.issn.1007-2861.2329

哑铃型氧化硅磨粒的制备及其化学机械抛光性能

董越，雷红，刘文庆

1.上海大学理学院纳米科学与技术研究中心，上海 200444； 2. 上海大学材料科学与工程学院材料研究所，上海 200444

出版日期:2023-04-30 发布日期:2023-04-30
通讯作者: 雷红 (1968—），男，教授，博士生导师，博士，研究方向为化学机械抛光等 E-mail:hong_lei2005@163.com
基金资助:
国家自然科学基金资助项目(51975343）

Preparation of dumbbell-shaped silica abrasives and their chemical mechanical polishing performances

DONG Yue, LEI Hong, LIU Wenqing

1. Research Center of Nano Science and Technology, College of Sciences, Shanghai University, Shanghai 200444, China; 2 Institute of Materials, School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China

Online:2023-04-30 Published:2023-04-30

摘要/Abstract

摘要： 通过阴离子诱导辅助生长法制备哑铃形氧化硅磨粒, 并对哑铃形氧化硅磨粒进行表征, 研究该磨粒对氧化锆陶瓷化学机械抛光 (chemical mechanical polishing, CMP) 性能的影响. 实验结果表明: 哑铃形氧化硅磨粒稳定性好、分散性好, 具有优异的化学机械抛光性能. 与球形氧化硅磨粒相比, 用哑铃形氧化硅磨粒对氧化锆陶瓷抛光时, 材料去除率提高 39%, 抛光后陶瓷表面平整光滑, 表面粗糙度为 1.960 nm. 这是因为哑铃形氧化硅磨粒抛光液润湿性好, 可以与氧化锆陶瓷表面充分接触, 有利于固相化学反应的发生. 此外, 哑铃形氧化硅磨粒的摩擦系数更大, 这使得机械效应显著增强.

关键词: 化学机械抛光, 氧化锆陶瓷, 哑铃型氧化硅磨粒, 材料去除率, 表面质量

Abstract: In this study, dumbbell-shaped silica abrasives were prepared by an anioninduced assisted growth method and characterized. The effects of the abrasives on the chemical mechanical polishing (CMP) performances of zirconia ceramics were then studied. The results showed that the abrasives had good stability and dispersion and exhibited excellent CMP properties. Compared with spherical silica abrasives, the material removal rate of the dumbbell-shaped silica abrasives increased by 39%, and the surfaces of the zirconia ceramics were flat and smooth following polishing, where the surface roughness was 1.960 nm. This was due to the fact the polishing fluid with the abrasives had good wettability and adequately contacted the surfaces of the zirconia ceramics, which helped to induce solid-phase chemical reactions. In addition, the coefficient of friction of the dumbbell-shaped silica was higher, significantly enhancing the mechanical effect.

Key words: 化学机械抛光, 氧化锆陶瓷, 哑铃型氧化硅磨粒, 材料去除率, 表面质量

中图分类号:

董越, 雷红, 刘文庆. 哑铃型氧化硅磨粒的制备及其化学机械抛光性能[J]. 上海大学学报(自然科学版), 2023, 29(2): 345-.

DONG Yue, LEI Hong, LIU Wenqing. Preparation of dumbbell-shaped silica abrasives and their chemical mechanical polishing performances[J]. Journal of Shanghai University（Natural Science Edition）, 2023, 29(2): 345-.

哑铃型氧化硅磨粒的制备及其化学机械抛光性能

Preparation of dumbbell-shaped silica abrasives and their chemical mechanical polishing performances

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