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Journal of Shanghai University >

2018 , Vol. 24 >Issue 2: 207 - 216

DOI: https://doi.org/10.12066/j.issn.1007-2861.1816

Research Articles

Photoelectric-response enhancement of local surface plasmon in Ge

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  • 1. College of Sciences, Shanghai University, Shanghai 200444, China
    2. International Centre for Quantum and Molecular Structures, Shanghai University, Shanghai 200444, China
    3. State Key Laboratory of Functional Materials for Informatics, Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China

Received date: 2016-05-17

  Online published: 2018-05-07

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Abstract

Local surface plasmon resonance (LSPR) is attracting much attention in nano-optoelectronics because of the unique photo response. Ge is an essential microelectronic material. But its photoelectric response is weak in the near-infrared region. Combination of the local surface plasmon and Ge can improve photoelectric response of Ge. The local surface plasmon resonance properties in Ge consisting of one, two and three silver nanoparticles cluster embedded in the Ge bulk are investigated using a finite difference time domain (FDTD) method. The extinction cross sections of one, two, and three silver nanoparticles are discussed in detail. The results show that the composite structure can effectively enhance extinction of Ge in a wide-range from visible to near-infrared. Moreover, the clusters show new types of photo responses as compared with single silver nanoparticle. The results also suggest that photo responses determined by local surface plasmon resonance depend strongly on conditions such as polarization directions of incident light, number of particles, size of single particle, and gap distances. This study is of significance for Ge applications and utilization of local surface plasmon resonance in optoelectronics.

Key words： optoelectronics; local surface plasmon resonance (LSPR); finite difference time domain (FDTD) method; silver nanoparticle; extinction cross section

Cite this article

QI Gongmin, DI Zengfeng, REN Wei . Photoelectric-response enhancement of local surface plasmon in Ge[J]. Journal of Shanghai University, 2018 , 24(2) : 207 -216 . DOI: 10.12066/j.issn.1007-2861.1816

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