[1] Fei W, Trommer J, Lemme M C, et al. Emerging reconflgurable electronic devices based on two-dimensional materials: a review [J]. InfoMat, 2022, 4(10): e12355. [2] Zhang H T, Park T J, Islam A N M N, et al. Reconflgurable perovskite nickelate electronics for artificial intelligence [J]. Science, 2022, 375(6580): 533-539. [3] Park Y J, Sharma B K, Shinde S M, et al. All MoS2-based large area, skin-attachable active-matrix tactile sensor [J]. ACS Nano, 2019, 13(3): 3023-3030. [4] Oh J Y, Bao Z. Second skin enabled by advanced electronics [J]. Advanced Science, 2019, 6(11): 1900186. [5] Choi M, Park Y J, Sharma B K, et al. Flexible active-matrix organic light-emitting diode display enabled by MoS2 thin-film transistor [J]. Science Advances, 2018, 4(4): eaas8721. [6] Shawkat M S, Chung H S, Dev D, et al. Two-dimensional/three-dimensional Schottky junction photovoltaic devices realized by the direct CVD growth of vdW 2D PtSe2 layers on silicon [J]. ACS Applied Materials & Interfaces, 2019, 11(30): 27251-27258. [7] Peng R, Wu Y, Wang B, et al. Programmable graded doping for reconflgurable molybdenum ditelluride devices [J]. Nature Electronics, 2023, 6(11): 852-861. [8] Sun X, Zhu C, Liu H, et al. Contact and injection engineering for low SS reconflgurable FETs and high gain complementary inverters [J]. Science Bulletin, 2020, 65(23): 2007-2013. [9] Larentis S, Fallahazad B, Movva H C P, et al. Reconflgurable complementary monolayer MoTe2 field-effect transistors for integrated circuits [J]. ACS Nano, 2017, 11(5): 4832-4839. [10] Wang Z, Xia H, Wang P, et al. Controllable doping in 2D layered materials [J]. Advanced Materials, 2021, 33(48): 2104942. [11] Resta G V, Balaji Y, Lin D, et al. Doping-free complementary logic gates enabled by twodimensional polarity-controllable transistors [J]. ACS nano, 2018, 12(7): 7039-7047. [12] Wu P, Reis D, Hu X S, et al. Two-dimensional transistors with reconflgurable polarities for secure circuits [J]. Nature Electronics, 2021, 4(1): 45-53. [13] Wu P, Ameen T, Zhang H, et al. Complementary black phosphorus tunneling field-effect transistors [J]. ACS nano, 2018, 13(1): 377-385. [14] Hu W, Sheng Z, Hou X, et al. Ambipolar 2D semiconductors and emerging device applications [J]. Small Methods, 2021, 5(1): 2000837. [15] Yu W J, Kim U J, Kang B R, et al. Adaptive logic circuits with doping-free ambipolar carbon nanotube transistors [J]. Nano Letters, 2009, 9(4): 1401-1405. [16] Lin Y F, Xu Y, Wang S T, et al. Ambipolar MoTe2 transistors and their applications in logic circuits [J]. Advanced Materials, 2014, 26(20): 3263-3269. [17] Nakaharai S, Yamamoto M, Ueno K, et al. Electrostatically reversible polarity of ambipolar fi-MoTe2 transistors [J]. ACS Nano, 2015, 9(6): 5976-5983. [18] Ren Y, Yang X, Zhou L, et al. Recent advances in ambipolar transistors for functional applications [J]. Advanced Functional Materials, 2019, 29(40): 1902105. [19] Beck M E, Hersam M C. Emerging opportunities for electrostatic control in atomically thin devices [J]. ACS Nano, 2020, 14(6): 6498-6518. [20] Cristoloveanu S, Lee K H, Park H, et al. The concept of electrostatic doping and related devices [J]. Solid-State Electronics, 2019, 155: 32-43. [21] Wang J, Fang H, Wang X, et al. Recent progress on localized field enhanced two-dimensional material photodetectors from ultraviolet-visible to infrared [J]. Small, 2017, 13(35): 1700894. [22] Chen J, Zhu J, Wang Q, et al. Homogeneous 2D MoTe2 CMOS inverters and p-n junctions formed by laser-irradiation-induced p-type doping [J]. Small, 2020, 16(30): 2001428. [23] Luo P, Zhuge F, Zhang Q, et al. Doping engineering and functionalization of two-dimensional metal chalcogenides [J]. Nanoscale Horizons, 2019, 4(1): 26-51. [24] Nipane A, Karmakar D, Kaushik N, et al. Few-layer MoS2 p-type devices enabled by selective doping using low energy phosphorus implantation [J]. ACS Nano, 2016, 10(2): 2128-2137. [25] Liu J, Jiang J, Zhou Q, et al. Manipulation of π-aromatic conjugation in two-dimensional Sn-organic materials for e-cient lithium storage [J]. eScience, 2023, 3(2): 100094. [26] Dolui K, Rungger I, Das Pemmaraju C, et al. Possible doping strategies for MoS2 monolayers: an ab initio study [J]. Physical Review B, 2013, 88(7): 075420. [27] Yamamoto M, Nakaharai S, Ueno K, et al. Self-limiting oxides on WSe2 as controlled surface acceptors and low-resistance hole contacts [J]. Nano Letters, 2016, 16(4): 2720-2727. [28] Liu X, Qu D, Yuan Y, et al. Self-terminated surface monolayer oxidation induced robust degenerate doping in MoTe2 for low contact resistance [J]. ACS Applied Materials & Interfaces, 2020, 12(23): 26586-26592. [29] Hu H, Shi Z, Khan K, et al. Recent advances in doping engineering of black phosphorus [J]. Journal of Materials Chemistry A, 2020, 8(11): 5421-5441. [30] Chamlagain B, Cui Q, Paudel S, et al. Thermally oxidized two-dimensional TaS2 as a high-k gate dielectric for MoS2 field-effect transistors [J]. 2D Materials, 2017, 4: 031002. [31] Lan C, Kang X, Meng Y, et al. The origin of gate bias stress instability and hysteresis in monolayer WS2 transistors [J]. Nano Research, 2020, 13: 3278-3285. [32] Zheng Y, Gao J, Han C, et al. Ohmic contact engineering for two-dimensional materials [J]. Cell Reports Physical Science, 2021, 2(1): 100298. [33] Xiao B, Watanabe S. Oxygen vacancy effects on an amorphous-TaOx-based resistance switch: a first principles study [J]. Nanoscale, 2014, 6(17): 10169-10178. [34] Cai Q, Chen J, Liu S, et al. High dielectric response of TaOx thin film and its modiflcation by controlling oxygen vacancy concentration [J]. Journal of Materials Science: Materials in Electronics, 2023, 34(11): 969. |