Abstract: To improve the polishing efficiency of zirconia ceramics, Y³⁺ was doped on the surface of silica to obtain modified abrasives. X-ray photoelectron spectroscopy (XPS) analysis showed that the Y element exists in the modified abrasive in the form of Y(OH)₃. Results of scanning electron microscopy (SEM) and particle size analysis showed that the composite abrasives were spherical with a uniform particle size, and no aggregation and secondary particles appeared. Compared with the pure colloidal silica abrasive, the material removal rate (MRR) of the composite abrasives was increased by approximately 33%. It also changes the zeta potential of the silica particles and reduces the repulsion between the silica and zirconia ceramic surface. This increases the contact probability between the silica and zirconia ceramic wafer, resulting in an increase in the coefficient of friction.

Key words: zirconia ceramic, chemical mechanical polishing, abrasives, doped silica; Derjaguin-Landau-Verwey-Overbeek theory