中文
Electrical Properties Optimization of 50 V HVPMOS Based on 0.35 μm BCD Process
ZOU Rong1, MIN Jia-hua1, CHU Chu2, LIANG Xiao-yan1, ZHANG Tao1, TENG Jia-qi1
Journal of Shanghai University（Natural Science Edition） . 2013, (6): 567 -571 .  DOI: 10.3969/j.issn.1007-2861.2013.06.004