Abstract: In this study, dumbbell-shaped silica abrasives were prepared by an anioninduced assisted growth method and characterized. The effects of the abrasives on the chemical mechanical polishing (CMP) performances of zirconia ceramics were then studied. The results showed that the abrasives had good stability and dispersion and exhibited excellent CMP properties. Compared with spherical silica abrasives, the material removal rate of the dumbbell-shaped silica abrasives increased by 39%, and the surfaces of the zirconia ceramics were flat and smooth following polishing, where the surface roughness was 1.960 nm. This was due to the fact the polishing fluid with the abrasives had good wettability and adequately contacted the surfaces of the zirconia ceramics, which helped to induce solid-phase chemical reactions. In addition, the coefficient of friction of the dumbbell-shaped silica was higher, significantly enhancing the mechanical effect.

Key words: 化学机械抛光, 氧化锆陶瓷, 哑铃型氧化硅磨粒, 材料去除率, 表面质量