Bi2O3电致变色薄膜的膜厚甄选

展开
  • 上海大学 材料科学与工程,上海200444

收稿日期: 2021-05-08

  网络出版日期: 2021-07-09

Thickness selection of Bi2O3 electrochromic films

Expand
  • School of Materials Science and Engineering, Shanghai University, Shanghai 200444, China

Received date: 2021-05-08

  Online published: 2021-07-09

摘要

为了得到能够呈现出合理电致变色性能的 Bi2O3 薄膜, 需要筛选其膜厚. 通过磁控溅射法制备得到厚度为 20∼300 nm 的 Bi2O3 薄膜, 并利用 UH4150 紫外可见 (ultraviolet-visible, UV-Vis) 分光光度计和 CHI-660e 电化学工作站测试薄膜的电致变色性能. 采用扫描电子显微镜 (scanning electron microscope, SEM) 和 X 射线衍射仪 (X-ray diffraction, XRD) 分别检测了薄膜的表面形貌和物相结构. 对变色对比度 (∆Tλ=550 nm)、电致变色效率 (η) 以及性能保留度 (RTRη) 的表现进行综合甄别, 发现膜厚介于 60∼120 nm 之间的Bi2O3 薄膜的 ∆Tη 分别达到 25% 和 10 cm2/C, 并且具有较高的电致变色性能保留度(RT = 20%、Rη = 44.6%). 这可能与该厚度区间薄膜的主要物相为具有较高离子导电性的δ 相有关.

本文引用格式

吴浩, 赵加栋, 刘春雨, 俞圣雯 . Bi2O3电致变色薄膜的膜厚甄选[J]. 上海大学学报(自然科学版), 2024 , 30(1) : 43 -053 . DOI: 10.12066/j.issn.1007-2861.2323

Abstract

It is necessary to select appropriate thickness for the fabrication of Bi2O3 thin films with reasonable electrochromic properties. Bi2O3 thin films with an approximate range of 20∼300 nm in thickness were prepared by magnetron sputtering. The electrochromic properties of the films were analyzed by using ultraviolet-visible (UV-Vis) spectrophotometry and an electrochemical workstation. The surface morphology and phase structure of the thin films were investigated by scanning electron microscope (SEM) and X-ray diffraction (XRD). After comprehensive screening to assess their performance in terms of the color change contrast (∆Tλ=550 nm), electrochromic efficiency (η), and performance retention (RT , Rη ), the values of ∆T and η of Bi2O3 thin films with a thickness between 60 nm and 120 nm were found to reach 25% and 10 cm2/C, respectively. Furthermore, the retention of the electrochromic properties (RT = 20%, Rη = 44.6%) is high. This may be related to the fact that the main phase of the film in this thickness range is δ, which is characterized by high ionic conductivity.
文章导航

/